Professional Background

Selected Research Achievements  

• Ph.D. (Materials Science & Engineering) 2001, Stevens Institute of Technology, Hoboken, NJ
• Materials Scientist, 1989-1997, Nanjing Electronic Devices Institute, Nanjing, China
• M. S. (Semiconductor Physics & Devices) 1989, Nanjing University, Nanjing, China

Awards

• Science & Technology Advancement Award, Jiangsu Province
• Science & Technology Advancement Award, Nanjing Electronic Devices Institute

Research Experience

• Chemical gas sensor design and development for environmental and industry monitoring
• Reactive magnetron sputtering system development, characterization and problem solving
• High-frequency pulsed plasma diagnostics and study
• Process design and optimization for deposition of thin films with targeted specifications
• Characterization of structural, compositional, optical and electrical properties of nanoparticles, thin films and bulk materials

Selected Achievements

• Development of a novel sensing material with fast time response for building up hydrogen safety sensors
• Development of Dual Anode Magnetron Reactive Sputtering system as a technical approach to disappearing anode problem
• Pioneer study of fundamental time-resolved behavior of high frequency pulsed plasma in metallic and oxide modes
• Development of an AC substrate biasing method for deposition of dense dielectric thin films at ambient temperature
• Innovation of the hardware and software of an Mercury C-V Carrier Concentration Depth Profilometer for increased sample handling capacity by 100%